.
.
in hypersonic coating , the coating impact formed by solid particle impact as compared to other processes is which coating formed by molten or semi molten particles.
bonding temprature increase with increasing melting point of material
the material with melting point less than 1500 0c have critical bonding temprature less than room temprature, this make ceramic material which has melting temprature less than 15 00 0c bonded .
with spray particles 40 %melting degree coating with porosity 70% can be obtained
Task3:讲座二:2. Landau theory of martensitic and ferroelastic phase transitions-Ekhard Salje
cordierite have small thermal expansions. ceramics are good insulators
all hitech material other than silicon are made up of perovskite
lecture 2
introduction to mterial sciences, landau theory of martensitic and ferroelastic phase transition
the local hamiltonian
2
interfaces melts first
memory element of one nanometer square,
LECTURE 1
LOW TEMP MATERIAL
C60 is 0D
CNT is 1D
GRAPHENE/GRAPHITE 2/3D
3D BULK
2D QUANTUM WALL
1D QUANTUM WIRE
QUANTUM DOT
DIMENSION REDUCTION FROM 3D TO 2D THIS QUANTUM PHENOMENA CAN BE USED IN FUTURE ELECTRONICS.
FOR EXAMPLE, IN QUANTUM DOT ELECTRONS ARE CONFINED IN 3D BUT Q.DOT HAS 0 D.
CVD IS EASY TO LEARN TWO PERAMETERS, TEMPERATURE, CARRIER GASES I.E INERT GASES. THIS METHOD USED FOR ALL DIMENTIONAL QUANTUM MATERIALS.
MOLECULAR BEAM EPITAXY
SOPHISTICATD AND IMP DUE TO CLEAN ENVRONMENT,I.E VACCUME, CONTRIOL ELEMENT, SUBSTRATE TEMP AND LAYERS.
TYPICAL LAYER METHOD
IF SUBSTRATE HAVE DIFF LATICE CONSTANT THEN ISLAND GROWTH (VOLMER-WEBER) SOME SMALL 3D PARTICLES ARE ISLAND/
IF LATICE CONSTANT MATCHED :LAYER BY LAYER GROWTH (FRANK=VAN DER MERWE) MATERIAL DIFFUSE
STRANSKI KARAANOV (MIXED GROWTH)
INITIAL LAYER BY LAYER THEN 2D MIXTURE SOME AREA FROM FILMS OF THIN LAYER AND SOME AREA PALSTER, HOW TO CONTROL; CLEAN SURFACE AND CONTROL ENERGY
HOW TO CONTROL ENERGY: TO CONTROL SUBSTRATE TEMPRATURE: LARGE RANGE TO REDUCE TEMP TO SOME LOW DIFFUSING SMALL PARTICLE STICKS ON SURFSACE OR GET IT OUT TO TO COOL DOWN UPTO 1000 K.
WHY ULTRA HIGH VACCUME IMP
AMOUNT OF MATERIAL IS SO SMALL THAT WE DONT NEED ANY CONTAMINATION. 10 POWER -6 IS NOT NECESSARY WE NEED 10 POWER -8 TORR..NOTHING CAN GO INSIDE CHAMBER EXCEPT SMALL MOLECULES OF HYDROGEN GAS, BUT ITS RANGE IS VERY SMALL IF WE PUMP INSIDE WE CAN GET RID OF H MOLECULE ETC
ROTARY PUMP: BOTH HAVE MECHENICAL PARTS TO CREAT VACCUME
ION PUP WITHOUT NOISE, POWERFULL AND QUITE PUMP
TITANIUM SIBLIMATION PUMP, TO CREAT VACCUME IN SHORT TIME.
RESIDUAL GAS ON THE WALL WHICH CAN COOL DOWN CHAMBER ALSO
CHARACTERIZATION
SEM ,
EDS, CHEMICAL INFO,OXYGEN SUBSTRATE, C FROM CONTAMINATION,DISTRIBUTION OF ELEMENTS
AFM : TELL MORE INFO ABOUT THICKNESS, MOS2 SAMPLE HEIGHT IS 4NM SO 2D MATERIAL
ELECTRON GUM:
TUNG WIRE, LaB6 SINGLE CRYSTAL OR NEEDLE LIKE TUNGSTON WIRE
TEM CAN T5ELL PROFILE OF MATERAL:
SCANNING PROBE MICROSCOPY:SPM
INVENTED BY BINNIG ND ROHRER 1981,GET NOBEL PRIZE 1986. USING PHYSICAL PROBE OR NEEDLE
IT FORMS IMAGES OF SURFACE AS SEM: information about the surface topography and composition of the sample AND TEM:A TEM has many uses. Its main purpose is to create high magnification images of the internal structure of a sample . This can be used to gather information on crystalline structures, stress, internal fractures, contamination, and more
HOW STM WOK
HARD MATERIL TIP OF PROBE, TUNGSTEN TIP , BECAUDSE OF NOT ACHIEVING FULLY ULTRA HIGH VACCUME ALWAYS RESIDUAL GASES ABSORBED SUCH ASOXYGEN, CO OR OH GROUP.